专利名称:Semiconductor integrated circuit device with
reduced leakage current
发明人:Kenichi Osada,Koichiro Ishibashi,Yoshikazu
Saitoh,Akio Nishida,Masaru Nakamichi,NaokiKitai
申请号:US13352142申请日:20120117公开号:US08232589B2公开日:20120731
专利附图:
摘要:The gate tunnel leakage current is increased in the up-to-date process, so that
it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by abattery for use in a cellular phone and which needs to be in a standby mode at a lowleakage current. In a semiconductor integrated circuit device, the ground sourceelectrode lines of logic and memory circuits are kept at a ground potential in an activemode, and are kept at a voltage higher than the ground potential in an unselectedstandby mode. The gate tunnel leakage current can be reduced without destroying data.
申请人:Kenichi Osada,Koichiro Ishibashi,Yoshikazu Saitoh,Akio Nishida,MasaruNakamichi,Naoki Kitai
地址:Kawasaki JP,Warabi JP,Hamura JP,Tachikawa JP,Hitachinaka JP,Fussa JP
国籍:JP,JP,JP,JP,JP,JP
代理机构:Stites & Harbison, PLLC
代理人:Juan Carlos A. Marquez, Esq
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